Brooklyn, NY, United States of America

Denis Sharoukhov

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Nanotronics Imaging, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Denis Sharoukhov. Retrieved from https://idiyas.com/inventor/denis-sharoukhov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Mind of Denis Sharoukhov

Introduction

Denis Sharoukhov is a notable inventor based in Brooklyn, NY (US). He has made significant contributions to the field of imaging systems, particularly through his innovative patent related to deep photometric learning.

Latest Patents

Denis holds a patent for "Deep photometric learning (DPL) systems, apparatus and methods." This imaging system includes an apparatus with multiple light sources positioned at various angles relative to a stage that supports a specimen. The system is designed to capture numerous images of the specimen's surface. A computing system, in communication with the imaging apparatus, generates a 3D reconstruction of the specimen's surface by utilizing a deep learning model to create a height map based on the captured images.

Career Highlights

Denis is currently employed at Nanotronics Imaging, Inc., where he applies his expertise in imaging technology. His work focuses on advancing the capabilities of imaging systems through innovative methodologies.

Collaborations

Denis collaborates with talented individuals such as Matthew C Putman and Vadim Pinskiy, contributing to the development of cutting-edge imaging solutions.

Conclusion

Denis Sharoukhov's work in deep photometric learning exemplifies the intersection of technology and innovation in imaging systems. His contributions are paving the way for advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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