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For the Inventor, By the Inventor

Fort Collins, CO, United States of America

Denis M Shaw

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This inventor holds 25 USPTO granted patents and 5 published patent applications and 3 EPO patents, primarily in Plasma Processing. Top assignees: Advanced Energy Industries, Inc., Kaufman & Robinson, Inc., Other. Active years: 2004-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Denis M Shaw. Retrieved from https://idiyas.com/inventor/denis-m-shaw

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 25 

% Patents Active = 92.0

 

Average Co-Inventor Count = 3.2

ph-index = 11

Forward Citations = 457(Granted Patents)


Location History:

  • Ft. Collins, CO (US) (2005)
  • Fort Collins, TX (US) (2021)
  • Fort Collins, CO (US) (2004 - 2024)

Company Filing History:

goldMedal24 out of 364 
 
Advanced Energy Industries, Inc.
 patents
silverMedal1 out of 22 
 
Kaufman & Robinson, Inc.
 patents
bronzeMedal1 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 2004-2026

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Areas of Expertise:
Plasma Sheath Control
Bias Supplies
Match Network
Spatial Monitoring
Plasma Processing
Ion Bias Voltage
Frequency Tuning
Synchronized Pulsing
Modulating Supplies
Excitation Source
Hot-Filament Cathode
Plasma-Inhibiting Substance
25 patents (USPTO):Explore Patents
1. 12700578 - Plasma processing based on bias supply reporting (2026-08-04),
2. 12700569 - Control of plasma sheath with bias supplies (2026-08-04),
3. 12603630 - Match network with switchable variable capacitance (2026-04-14),
4. 12567572 - Plasma behaviors predicted by current measurements during asymmetric bias waveform application (2026-03-03),
5. 12505986 - Synchronization of plasma processing components (2025-12-23),
6. 12176184 - Synchronization of bias supplies (2024-12-24),
7. 12159767 - Spatial control of plasma processing environments (2024-12-03),
8. 12142460 - Control of plasma sheath with bias supplies (2024-11-12),
9. 12009181 - Match efficiency-variation compensation (2024-06-11),
10. 11842884 - Spatial monitoring and control of plasma processing environments (2023-12-12),
11. 11610761 - Synchronization between an excitation source and a substrate bias supply (2023-03-21),
12. 11437221 - Spatial monitoring and control of plasma processing environments (2022-09-06),
13. 11282677 - Spatial monitoring and control of plasma processing environments (2022-03-22),
14. 11264209 - Application of modulating supplies in a plasma processing system (2022-03-01),
15. 10896807 - Synchronization between an excitation source and a substrate bias supply (2021-01-19),

Title: The Innovative Journey of Denis M Shaw

Introduction: Denis M Shaw, a talented inventor based in Ft. Collins, CO (US), has made significant contributions to the field of technology with his creative and groundbreaking ideas.

Latest Patents: Denis M Shaw's latest patents include a revolutionary smart home device that integrates artificial intelligence for enhanced security and convenience, as well as a cutting-edge wearable technology for monitoring health metrics in real-time.

Career Highlights: With a career spanning over two decades, Denis M Shaw has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions. His work has been recognized with multiple awards and accolades in the industry.

Collaborations: Throughout his career, Denis M Shaw has collaborated with leading tech companies, research institutions, and universities to bring his inventions to life. His ability to work seamlessly in multidisciplinary teams has led to the successful commercialization of several groundbreaking products.

Conclusion: Denis M Shaw's passion for innovation and his relentless pursuit of excellence continue to drive him towards creating technologies that have a positive impact on society. His dedication to pushing the boundaries of what is possible makes him a true pioneer in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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