Acton, MA, United States of America

Denis G Fauteux

This inventor holds 56 USPTO granted patents, plus 2 CIPO patents, primarily in Electrochemical Cells (CPC class 4292). Top assignees: Mitsubishi Chemical Corporation, Arthur D. Little, Inc., Mhb Joint Venture. Active years: 1990-2005.


% Patents Active = 98.2

 

Average Co-Inventor Count = 2.4

ph-index = 19

Forward Citations = 1,365(Granted Patents)

Forward Citations (Not Self Cited) = 1,343(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Dayton, OH (US) (1990)
  • Miamisburg, OH (US) (1990)
  • US (1991)
  • Centerville, OH (US) (1990 - 1995)
  • Acton, MA (US) (1992 - 2005)

Company Filing History:


Years Active: 1990-2005

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Areas of Expertise:
Electrochemical Cell
Electrode Surface
Lithium Ion
Battery Apparatus
Electrode Modification
Current Collector
Fabrication Process
High Power
Carbon Materials
Electrolytic Process
Doped Electrolyte
Nano-Sized Inclusions
56 patents (USPTO):Explore Patents

Title: The Innovative Journey of Denis G Fauteux

Introduction: Denis G Fauteux is a pioneering inventor based in Acton, MA (US) known for his groundbreaking contributions to the field of innovations and inventions.

Latest Patents: Denis G Fauteux holds several patents in various technological domains, showcasing his continuous dedication to pushing the boundaries of innovation.

Career Highlights: Throughout his illustrious career, Denis G Fauteux has demonstrated a remarkable ability to transform ideas into tangible inventions that have the potential to revolutionize industries.

Collaborations: Denis G Fauteux has collaborated with leading research institutions, universities, and companies to further develop his inventions, highlighting his commitment to fostering innovation through partnerships.

Conclusion: Denis G Fauteux's passion for innovation and his relentless pursuit of technological advancement make him a standout figure in the world of inventors, leaving a lasting impact on the landscape of inventions.

Profile summary based on public USPTO records.
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