Company Filing History:
Years Active: 2005-2013
Title: Innovations by Denis Finbarr O'Connell
Introduction
Denis Finbarr O'Connell is a notable inventor based in Palo Alto, CA. He has made significant contributions to the field of integrated circuits, holding a total of 4 patents. His work focuses on improving semiconductor technology, which is crucial for the advancement of electronic devices.
Latest Patents
O'Connell's latest patents include a method and apparatus for reducing plasma process induced damage in integrated circuits. This innovation addresses the issue of plasma process induced damage (PPID) that can occur when depositing a dielectric onto conductive materials. By reducing electric charge accumulation during the plasma process, O'Connell's method enhances the reliability of integrated circuits. Another significant patent is the method of selective oxygen implantation to dielectrically isolate semiconductor devices using no extra masks. This technique allows for the fabrication of integrated circuit structures by utilizing existing masks to introduce oxygen into bulk silicon, resulting in a cost-effective and latch-up immune solution compared to traditional silicon-on-insulator techniques.
Career Highlights
Denis O'Connell has had a distinguished career at National Semiconductor Corporation, where he has been instrumental in developing innovative solutions for semiconductor manufacturing. His expertise in integrated circuits has positioned him as a key figure in the industry.
Collaborations
Throughout his career, O'Connell has collaborated with talented individuals such as Prasad Chaparala and Douglas Brisbin. These collaborations have further enriched his work and contributed to the success of various projects.
Conclusion
Denis Finbarr O'Connell's contributions to the field of integrated circuits through his patents and collaborations highlight his importance as an inventor. His innovative methods continue to influence the semiconductor industry and pave the way for future advancements.