Denis A Robitaille

Title: Innovations by Denis A Robitaille in Ion Implantation Technology

Introduction

Denis A Robitaille, an inventive mind based in Ipswich, MA, has made significant contributions to the field of ion implantation technology. With two patents to his name, he has demonstrated a keen ability to innovate and enhance processes within this specialized arena.

Latest Patents

Denis's latest patents include an "Ion source with tailored extraction shape" and a "Vacuum system cold trap filter." The first patent describes an ion implantation system featuring an ion source designed to create a precise ion beam. This ion source contains an arc chamber housing that maintains a dense concentration of ions. A unique extraction member, which is part of the system, possesses a specially configured extraction aperture that modifies the ion beam profile, ensuring a uniform beam current across its dimension. Notably, the extraction aperture is shaped as an elongated slit, varying in width, with wider ends and a narrower middle, further refining the ion beam output.

His second patent, the "Vacuum system cold trap filter," outlines a method for filtering chemical species from a vacuum system used in ion implantation. This innovative cold trap filter includes a canister connected to a high vacuum pump's exhaust and a roughing pump's intake, facilitating the evacuation of the ion source chamber. Inside the canister, paddles cooled via a coolant source condense or deposit chemical species while maintaining the vacuum capacity of the pumps. Additionally, these paddles can be biased to attract chemical species electrostatically, enhancing their efficacy in filtering.

Career Highlights

Denis Robitaille is affiliated with Axcelis Technologies, Inc., where he leverages his expertise in ion implantation systems to drive advancements in the semiconductor manufacturing sector. His work reflects a commitment to innovation and excellence, positioning his contributions as vital to the company's mission of providing cutting-edge technology solutions.

Collaborations

Throughout his career, Denis has collaborated with notable colleagues such as Patrick T Heres and William P Reynolds. These partnerships have fostered a dynamic environment for innovative thinking and problem-solving, further amplifying the impact of their collective work in the field.

Conclusion

Denis A Robitaille stands out as an inventor dedicated to advancing ion implantation technology through his innovative patents. His work at Axcelis Technologies, Inc. and collaborations with fellow inventors underline the importance of teamwork in the creative process. As the industry evolves, contributions from inventors like Denis will continue to shape the future, ensuring continued progress in semiconductor manufacturing and beyond.