Deepti Pant

Title: Deepti Pant: Innovator in Photosensitive Materials

Introduction

Deepti Pant is a prominent inventor based in Woburn, MA (US). She has made significant contributions to the field of photosensitive materials, particularly in the development of compositions suitable for waveguide devices. With a total of 5 patents to her name, her work has garnered attention in both academic and industrial circles.

Latest Patents

One of her latest patents involves a photosensitive acrylate composition and waveguide device. This innovative composition is designed for practical waveguide applications and includes at least one multifunctional acrylate derived from a fluorinated multifunctional alcohol, along with at least one photoinitiator. The composition boasts several advantageous properties, including high photo contrast, rapid curing speed, controllable refractive index, low curing shrinkage, high thermo-optic coefficient, low volatility, and high viscosity. A waveguide device is created by patterning this photosensitive composition, showcasing its practical applications in modern technology.

Career Highlights

Throughout her career, Deepti Pant has worked with notable companies such as E.I. DuPont de Nemours and Company and Corning Incorporated. Her experience in these organizations has allowed her to refine her expertise in materials science and innovation.

Collaborations

Deepti has collaborated with esteemed colleagues, including Louay A. Eldada and Chuck C. Xu. These partnerships have further enriched her research and development efforts in the field of photosensitive materials.

Conclusion

Deepti Pant's contributions to the field of photosensitive materials and waveguide devices highlight her innovative spirit and dedication to advancing technology. Her work continues to influence the industry and inspire future innovations.