E.i. Dupont De Nemours and Company

Corning Incorporated

Deepti Pant

Louay A Eldada

Chuck C Xu

Chris E Osuch

Karl Wayne Beeson

Indira Pottebaum

Fang Wang

Lawrence W Shacklette

Paul Michael Ferm

Baopei Xu

Macrae Maxfield

George Boudoughian

Kevin Battell

A photosensitive composition suitable for practical waveguide devices is provided. The photosensitive composition comprises at least one multifunctional acrylate prepared from a fluorinated multifunctional alcohol and at least one photoinitiator. The said composition has high photo contrast, high curing speed, controllable refractive index, low curing shrinkage, high thermo-optic coefficient, low volatility and high viscosity. A waveguide device is formed by patterning the photosensitive composition.

Photosensitive acrylate composition and waveguide device

The invention relates to a process a process for forming single-mode, organic waveguides employing organic polymeric materials. The process reduces dissolved and gaseous oxygen content to very low quantities, resulting in production of waveguides having superior properties and manufacturability. Also provided is a process for preventing loss of light due to cores having flared ends. A waveguide is produced by sequentially a layer of a liquid, photosensitive buffer and clad composition to a surface of a substrate; deoxygenating under vacuum; overall exposing under an inert gas actinic radiation to partially polymerize the compositions below a full curing. Coating a photosensitive core composition to the clad composition; deoxygenating under vacuum, covering with an inert gas atmosphere; positioning a photomask above, but not in contact with the core layer; imagewise exposing the core through a photomask pattern to actinic radiation to partially polymerize the core composition; developing core; coating a photosensitive overclad composition over the image areas of the core composition; deoxygenating under vacuum; overall exposing the overclad composition, under inert gas to actinic radiation to substantially fully cure the optional buffer composition, the underclad composition, the core composition and the clad composition.

Polymer waveguide fabrication process

A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.

Fluorinated photopolymer composition and waveguide device

A single mode optical waveguide which is lithographically formed and employs polymeric materials having low propagation loss. The optical waveguide has a substrate, a polymeric, buffer layer having an index of refraction n disposed on a surface of the substrate, a patterned, light-transmissive core layer having an index of refraction n disposed directly on a surface of the cladding layer, and an overcladding layer having an index of refraction n on a top surface of the core, side walls of the core, and exposed portions of the buffer layer, with n <n <n and &Dgr;n&equals;n &minus;n .

Optimized multi-layer optical waveguiding system

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Woburn, MA, United States of America

Deepti Pant