Deepasree Konduparthi

Title: Innovations by Deepasree Konduparthi

Introduction

Deepasree Konduparthi is a notable inventor based in Clifton Park, NY (US). She has made significant contributions to the field of integrated circuits and FinFET devices. With a total of 3 patents, her work showcases her expertise and innovative spirit.

Latest Patents

Her latest patents include methods of forming integrated circuits with a planarized permanent layer and methods for forming FinFET devices with a planarized permanent layer. These patents provide devices and methods for creating integrated circuits and FinFET devices that feature a planarized permanent layer. In one embodiment, a method of forming a planarized permanent layer involves providing a base substrate with uneven surface topography. A permanent layer is conformally formed over this substrate, which includes raised and sunken portions that correspond to the substrate's surface topography. A sacrificial layer is then conformally formed over the permanent layer, and both layers undergo chemical-mechanical planarization to achieve the desired planarized permanent layer. The sacrificial layer is subsequently removed after the planarizing process.

Career Highlights

Deepasree currently works at GlobalFoundries Inc., where she continues to push the boundaries of technology in semiconductor manufacturing. Her innovative approaches have garnered attention in the industry, contributing to advancements in integrated circuit design.

Collaborations

She collaborates with talented individuals such as Dinesh R Koli and Changyong Xiao, further enhancing her work through teamwork and shared expertise.

Conclusion

Deepasree Konduparthi's contributions to the field of integrated circuits and FinFET devices highlight her role as a leading inventor. Her innovative patents and collaborative efforts continue to shape the future of technology.