Company Filing History:
Years Active: 2004-2006
Title: The Innovations of Deepak Verma
Introduction
Deepak Verma is a notable inventor based in Scottsdale, AZ (US). He has made significant contributions to the field of chemical mechanical polishing, particularly in the development of innovative compositions and methods. With a total of 3 patents to his name, Verma's work has had a substantial impact on the industry.
Latest Patents
Verma's latest patents include two key innovations. The first patent is titled "Chemical mechanical polishing compositions for metal and associated materials and method of using same." This invention describes a chemical mechanical polishing slurry composition designed for polishing copper, barrier material, and dielectric material. The method involves a two-step slurry process, where the first-step slurry has a high removal rate on copper and a low removal rate on barrier material, while the second-step slurry reverses these rates. The first slurry comprises at least an organic polymeric abrasive.
The second patent is titled "Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same." This invention presents an abrasive-free formulation for chemical mechanical polishing, which also targets copper and related materials. The formulation boasts a high removal rate on copper and a low removal rate on barrier material, utilizing at least an oxidizing agent and an activating agent.
Career Highlights
Deepak Verma is currently employed at Advanced Technology Materials, Inc., where he continues to innovate in the field of chemical mechanical polishing. His expertise and contributions have positioned him as a key player in the industry.
Collaborations
Verma has collaborated with several talented individuals, including Ying Ma and Thomas H Baum. These partnerships have further enhanced his work and contributed to the success of his inventions.
Conclusion
Deepak Verma's innovative work in chemical mechanical polishing has led to significant advancements in the field. His patents reflect a commitment to improving polishing processes and materials, showcasing his expertise and dedication to innovation.