Company Filing History:
Years Active: 2004-2009
Title: Debra Fenzel-Alexander: Innovator in Lithographic Photoresist Compositions
Introduction
Debra Fenzel-Alexander, a distinguished inventor based in San Jose, California, has made significant contributions to the field of materials science and engineering. With a robust portfolio of five patents, she has focused her research on developing advanced silsesquioxane polymers for innovative applications in lithography.
Latest Patents
Her latest patents include groundbreaking work on fluorinated silsesquioxane polymers and their use in lithographic photoresist compositions. These polymers are designed to be substantially transparent to ultraviolet radiation (UV), including wavelengths less than 365 nm, and deep ultraviolet radiation (DUV) at wavelengths below 250 nm, such as 157 nm, 193 nm, and 248 nm. This makes them exceptionally useful in both single and bilayer, positive and negative, lithographic photoresist applications. Her innovations have led to enhanced sensitivity and resolution in the manufacturing process of integrated circuits, highlighting their significance in modern technology.
Career Highlights
Debra is currently affiliated with the International Business Machines Corporation (IBM), where she collaborates with a talented team dedicated to pushing the boundaries of technological advancements. Her work stands out for its relevance and practical applications in the fast-evolving semiconductor industry.
Collaborations
In her pursuit of innovation, Debra has worked closely with esteemed colleagues, including Robert David Allen and Ratnam Sooriyakumaran. These collaborations reflect a synergy of expertise that fosters a creative environment for research and development.
Conclusion
Debra Fenzel-Alexander exemplifies the spirit of innovation through her impressive contributions to the field of lithography and materials science. With a focus on developing functional polymers, she continues to impact the technology landscape significantly, paving the way for the next generation of integrated circuits and enhancing industrial processes.
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