Location History:
- Monroe, CT (US) (2002)
- Brookfield, CT (US) (2000 - 2006)
Company Filing History:
4 out of 622 
6 out of 832,880 Years Active: 2000-2006
Title: The Innovative Contributions of Debra A Desrochers
Introduction
Debra A Desrochers is a prominent inventor based in Brookfield, CT (US). She has made significant contributions to the field of materials science, particularly in the development of processes for creating advanced ceramic thin films. With a total of 10 patents to her name, her work has implications for the future of ferroelectric memory devices.
Latest Patents
One of her latest patents is a low temperature chemical vapor deposition (CVD) process for forming bismuth-containing ceramic thin films. This innovative process is particularly useful in the fabrication of ferroelectric memory devices. The bismuth-containing film can be formed using a tris(β-diketonate) bismuth precursor. Films of amorphous SBT can be created through CVD and subsequently ferroannealed to produce films with Aurivillius phase composition. These films exhibit superior ferroelectric properties, making them suitable for the manufacturing of high-density FRAMs.
Career Highlights
Throughout her career, Debra has worked with various organizations, including Advanced Technology Materials, Inc. Her expertise in chemical vapor deposition processes has positioned her as a leader in her field.
Collaborations
Debra has collaborated with notable professionals such as Frank S Hintermaier and Jeffrey F Roeder. Their combined efforts have contributed to advancements in the technology surrounding ferroelectric materials.
Conclusion
Debra A Desrochers is a trailblazer in the field of materials science, with a focus on innovative processes for ceramic thin films. Her contributions are paving the way for advancements in ferroelectric memory devices, showcasing her impact on technology and innovation.