Atlanta, GA, United States of America

Debin Wang

This inventor holds 1 USPTO granted patent. Top assignee: Georgia Tech Research Corporation. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Debin Wang. Retrieved from https://idiyas.com/inventor/debin-wang-qxkwvyq4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 11.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Debin Wang: Innovator in Thermochemical Nanolithography

Introduction

Debin Wang is a prominent inventor based in Atlanta, GA (US). He has made significant contributions to the field of nanolithography, particularly through his innovative patent that enhances the capabilities of this technology.

Latest Patents

Debin Wang holds a patent for "Thermochemical nanolithography components, systems, and methods." This patent describes improved nanolithography components, systems, and methods that utilize a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. Additionally, certain polymeric compositions are disclosed in this patent, showcasing his inventive approach to advancing nanolithography.

Career Highlights

Debin Wang is affiliated with the Georgia Tech Research Corporation, where he continues to push the boundaries of research and innovation. His work has garnered attention for its potential applications in various fields, including materials science and engineering.

Collaborations

Throughout his career, Debin Wang has collaborated with notable colleagues such as Elisa Riedo and Seth R. Marder. These partnerships have contributed to the advancement of his research and the development of new technologies.

Conclusion

Debin Wang's contributions to thermochemical nanolithography exemplify the innovative spirit of modern inventors. His work not only enhances existing technologies but also paves the way for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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