The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2013
Filed:
Jun. 01, 2010
Elisa Riedo, Atlanta, GA (US);
Seth R. Marder, Atlanta, GA (US);
Walt A. DE Heer, Atlanta, GA (US);
Robert J. Szoskiewicz, Manhattan, KS (US);
Vamsi K. Kodali, Visakhapatnam, IN;
Simon C. Jones, Los Angeles, CA (US);
Takashi Okada, Mie, JP;
Debin Wang, Atlanta, GA (US);
Jennifer E. Curtis, Atlanta, GA (US);
Clifford L. Henderson, Douglasville, GA (US);
Yueming Hua, Sunnyvale, CA (US);
Elisa Riedo, Atlanta, GA (US);
Seth R. Marder, Atlanta, GA (US);
Walt A. de Heer, Atlanta, GA (US);
Robert J. Szoskiewicz, Manhattan, KS (US);
Vamsi K. Kodali, Visakhapatnam, IN;
Simon C. Jones, Los Angeles, CA (US);
Takashi Okada, Mie, JP;
Debin Wang, Atlanta, GA (US);
Jennifer E. Curtis, Atlanta, GA (US);
Clifford L. Henderson, Douglasville, GA (US);
Yueming Hua, Sunnyvale, CA (US);
Georgia Tech Research Corporation, Atlanta, GA (US);
Abstract
Improved nanolithography components, systems, and methods are described herein. The systems and methods generally employ a resistively heated atomic force microscope tip to thermally induce a chemical change in a surface. In addition, certain polymeric compositions are also disclosed.