Essex Junction, VT, United States of America

Dean Allen Schaffer


Average Co-Inventor Count = 7.5

ph-index = 3

Forward Citations = 141(Granted Patents)


Location History:

  • South Burlington, VT (US) (1997)
  • Essex Junction, VT (US) (2002 - 2004)

Company Filing History:


Years Active: 1997-2004

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3 patents (USPTO):

Title: Dean Allen Schaffer: Pioneering Innovator in Semiconductor Technology

Introduction:

Dean Allen Schaffer, a notable inventor based in Essex Junction, VT, has made significant contributions to the field of semiconductor technology. With a strong background in material science and engineering, Schaffer has garnered recognition for his innovative patent developments in the industry.

Latest Patents:

1. "Slurry for mechanical polishing (CMP) of metals and use thereof" - Schaffer's patent involves novel slurry compositions for the chemical mechanical polishing (CMP) of metals, particularly targeted at enhancing the efficiency of semiconductor device manufacturing processes.

2. "Method for reworking copper metallurgy in semiconductor devices" - This patent showcases Schaffer's expertise in reworking copper metallurgy in semiconductor devices, optimizing the removal and redeposition processes for improved device performance and reliability.

Career Highlights:

Dean Allen Schaffer is currently associated with the renowned International Business Machines Corporation (IBM), where he continues to pioneer advancements in semiconductor technologies. Through his role at IBM, Schaffer has been instrumental in driving innovation and pushing the boundaries of material science applications in the semiconductor industry.

Collaborations:

Among Schaffer's notable coworkers are Eric Jeffrey White and William Francis Landers. The collaborative efforts of these experts have led to groundbreaking developments in semiconductor materials and processes, further solidifying their impact on the industry.

Conclusion:

Dean Allen Schaffer's remarkable journey as an inventor and innovator in semiconductor technology underscores his commitment to pushing the boundaries of what is possible in material science and engineering. His patents and collaborations serve as a testament to his unwavering dedication to driving progress and innovation in the semiconductor industry.

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