Taoyuan, Taiwan

Deak-Su Lee

This inventor holds 1 USPTO granted patent. Top assignee: Hannstar Display Corporation. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Deak-Su Lee. Retrieved from https://idiyas.com/inventor/deak-su-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Deak-Su Lee: Innovator in IPS-LCD Technology

Introduction

Deak-Su Lee is a prominent inventor based in Taoyuan, Taiwan. He is known for his significant contributions to the field of display technology, particularly in the manufacturing of In-Plane Switching Liquid Crystal Displays (IPS-LCD).

Latest Patents

Deak-Su Lee holds a patent for a "Method of manufacturing IPS-LCD using 4-mask process." This innovative method involves forming amorphous silicon islands and contact holes using the same mask. Each amorphous silicon island is utilized to create the channel of one transistor within the active area, while each contact hole contributes to forming a portion of an anti-ESD circuit surrounding the active area. The process also employs a phase-shift mask that includes high transmittance, low transmittance, and transparent areas.

Career Highlights

Deak-Su Lee is currently associated with Hannstar Display Corporation, where he continues to advance display technology. His work has been instrumental in enhancing the efficiency and performance of IPS-LCDs.

Collaborations

Deak-Su Lee collaborates with Sakae Tanaka, a talented woman in the field, contributing to innovative projects and research in display technology.

Conclusion

Deak-Su Lee's contributions to IPS-LCD technology through his innovative patent and collaboration with skilled professionals highlight his role as a key figure in the advancement of display manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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