White Plains, NY, United States of America

Dazhuang J Ma

This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Dazhuang J Ma. Retrieved from https://idiyas.com/inventor/dazhuang-j-ma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Dazhuang J Ma: Innovator in Semiconductor Design

Introduction

Dazhuang J Ma is a notable inventor based in White Plains, NY (US). He has made significant contributions to the field of semiconductor design, particularly through his innovative methods and apparatuses.

Latest Patents

Dazhuang holds a patent for a "Method and apparatus for parallel processing of semiconductor chip designs." This invention outlines a method that includes flattening a netlist corresponding to a semiconductor chip design, performing logic clustering on logic elements in the flattened netlist, partitioning the design according to these clusters, and designing the individual partitions in parallel. This approach enhances the efficiency of semiconductor chip design processes.

Career Highlights

Dazhuang is associated with International Business Machines Corporation (IBM), where he applies his expertise in semiconductor technology. His work has contributed to advancements in the efficiency and effectiveness of chip design methodologies.

Collaborations

Dazhuang has collaborated with notable colleagues, including Michael W Dotson and Anthony DeGroff Drumm. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Dazhuang J Ma's contributions to semiconductor design through his patented methods exemplify the importance of innovation in technology. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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