This inventor holds 1 USPTO granted patent. Top assignee: Ut-Battelle, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Dayrl P. Briggs: Innovator in Chemical Vapor Deposition
Introduction
Dayrl P. Briggs is a notable inventor based in Oak Ridge, TN (US). He has made significant contributions to the field of materials science, particularly in the synthesis of hexagonal boron nitride films and nanostructures. His innovative approach has the potential to impact various industries, including electronics and materials engineering.
Latest Patents
Briggs holds a patent for a method titled "Chemical vapor deposition growth of hexagonal boron nitride films and nanostructures." This scalable method synthesizes hexagonal boron nitride (hBN) films and nanotubes through chemical vapor deposition (CVD). The process utilizes atmospheric pressure CVD on metallic growth substrates with solid boron sources and molecular nitrogen. The solid boron source can be in various forms, including powder, fragments, or platelets, and can be positioned upstream, on top, or below the growth substrate. The substrates can consist of metals such as Fe, Ni, Cr, Cu, and their alloys, including various steels. The growth atmosphere comprises nitrogen compounds, inert gases, and hydrogen. The reaction occurs within a vessel heated to temperatures between 800° C. and 1200° C. in less than 120 minutes, followed by controlled sequential cooling. Laboratory tests have shown that the hBN film provides enhanced protection against harsh corrosion over extended periods and demonstrates resistance to high-temperature oxidation in air. Briggs holds 1 patent.
Career Highlights
Briggs is associated with UT-Battelle, Inc., where he has contributed to research and development in advanced materials. His work has been instrumental in advancing the understanding and application of chemical vapor deposition techniques.
Collaborations
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Conclusion
Dayrl P. Briggs is a pioneering inventor whose work in chemical vapor deposition has opened new avenues for the synthesis of advanced materials. His contributions are poised to influence various technological fields significantly.
