Hod-Hasharon, Israel

Davidi Kalir

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Davidi Kalir. Retrieved from https://idiyas.com/inventor/davidi-kalir-u9nxe3ot

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Davidi Kalir - Innovator in Digital Photolithography

Introduction

Davidi Kalir is a notable inventor based in Hod-Hasharon, Israel. He has made significant contributions to the field of digital lithography, particularly through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of photolithography systems.

Latest Patents

Kalir holds a patent for a "Digital photolithography system, components thereof and related methods." This patent describes a digital lithography system that includes a rotation assembly for an exposure unit. The assembly features a kinematic socket designed to support the exposure unit, which allows for precise tip and tilt movements. The system aims to stabilize the movement of the exposure unit while providing a reliable point of contact during operation.

Career Highlights

Kalir is currently associated with Applied Materials, Inc., a leading company in the field of materials engineering. His role involves developing advanced technologies that push the boundaries of photolithography. His expertise and innovative mindset have positioned him as a key player in his field.

Collaborations

One of his notable coworkers is Assaf Kidron, with whom he collaborates on various projects related to digital lithography systems. Their combined efforts contribute to the advancement of technologies in this area.

Conclusion

Davidi Kalir's contributions to digital photolithography exemplify the impact of innovation in technology. His patent and work at Applied Materials, Inc. highlight his commitment to advancing the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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