The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2026

Filed:

Dec. 09, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Assaf Kidron, Cupertino, CA (US);

Rudolf Brunner, Menlo Park, CA (US);

Davidi Kalir, Hod Hashron, IL;

Timothy Thomas, Portland, OR (US);

Anilkumar Borkar, Bangalore, IN;

Jiawei Shi, Union City, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70833 (2013.01); G03F 7/70975 (2013.01);
Abstract

Embodiments of the disclosure relate to digital lithography systems and components thereof. Digital lithography systems may include a rotation assembly for an exposure unit, including a kinematic socket configured to support the exposure unit, the kinematic socket having a socket seat and a sphere received in the socket seat, wherein the socket seat is configured to support a load of the exposure unit during translational movement and the sphere is a pivot point for tip and tilt movement; and a motor configured to rotate the one or more exposure unit via the kinematic socket. The rotation assembly may provide a point of contact for the exposure unit together with two additional points of contact that stabilize movement of the exposure unit. Also disclosed are methods of preparation and use of such systems and components.


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