Singapore, Singapore

David Yeo Yong Hock

This inventor holds 1 USPTO granted patent. Top assignee: Chartered Semiconductor Manufacturing Ltd (Corporation). Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Yeo Yong Hock. Retrieved from https://idiyas.com/inventor/david-yeo-yong-hock

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: **Inventor Spotlight: David Yeo Yong Hock**

Introduction

David Yeo Yong Hock is an accomplished inventor based in Singapore. He has made significant contributions to the field of silicon oxidation technology, specifically aimed at improving the performance of integrated circuits. With his innovative approach, he has secured a patent that enhances the manufacturing processes within the semiconductor industry.

Latest Patents

David Yeo's notable patent, titled "Dislocation Free Local Oxidation of Silicon with Suppression of Narrow Space Field Oxide Thinning Effect," introduces a novel design of an oxidation mask. This innovative mask offers improved control over the field oxide isolation profile in the vicinity of the "birds beak" phenomenon, particularly relevant in sub half-micron integrated circuit technology. The design features a thin silicon nitride foot that allows for controlled oxide expansion during the early oxidation stages, which facilitates in-situ stress relief and smoothing of the oxide profile. Furthermore, a cantilevered section of a thicker silicon nitride layer prevents the upward movement of this foot during later oxidation stages, thereby inhibiting any unwanted growth associated with the birds beak. This groundbreaking approach has shown to reduce dislocation generation shear stresses by as much as fifty-fold, leading to improved surface topography and effectively suppressing the narrow oxide thinning effect.

Career Highlights

David is currently associated with Chartered Semiconductor Manufacturing Ltd, where his expertise in silicon oxidation plays a vital role in advancing semiconductor technology. His work in this industry is critical for the continuous enhancement of integrated circuit manufacturing processes.

Collaborations

During his career, David has collaborated with several notable professionals, including Igor V Peidous and Elgin Kiok Quek. These collaborations have enabled him to leverage collective expertise and drive innovative solutions within the semiconductor sector.

Conclusion

David Yeo Yong Hock is a prominent figure in the realm of semiconductor technology, particularly recognized for his innovative contributions towards enhancing silicon oxidation processes. His pioneering patent reflects a commitment to excellence in integrated circuit design and manufacturing, further solidifying his reputation as a leading inventor in Singapore's technology landscape.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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