David Wasinger

Title: David Wasinger: Innovator in Non-Destructive Gap Metrology

Introduction

David Wasinger is a notable inventor based in Chandler, AZ (US). He has made significant contributions to the field of metrology, particularly in the area of semiconductor thickness measurements. His innovative work has led to the development of a unique metrology system that enhances measurement accuracy.

Latest Patents

David Wasinger holds 1 patent for his invention titled "Non-destructive gap metrology." This patent describes a metrology system equipped with 3-dimensional sensors designed for precise thickness measurements of semiconductor elements. The system utilizes a single or dual 3-dimensional profiler that scans both the top and bottom surfaces of an element to obtain accurate thickness measurements. Additionally, the method can measure gaps between assembled elements, showcasing its versatility and importance in semiconductor manufacturing.

Career Highlights

David Wasinger is currently employed at Intel Corporation, where he continues to push the boundaries of innovation in semiconductor technology. His work at Intel has positioned him as a key player in advancing metrology techniques that are crucial for the industry.

Collaborations

Throughout his career, David has collaborated with esteemed colleagues, including Jianyong Mo and V Wade Singleton. These collaborations have fostered an environment of innovation and have contributed to the success of various projects within the company.

Conclusion

David Wasinger is a prominent inventor whose work in non-destructive gap metrology has made a significant impact on the semiconductor industry. His innovative approach and dedication to advancing measurement techniques continue to inspire future developments in the field.