This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: 3M Innovative Properties Company. Active years: 2017.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017
Title: David W. Worthey: Inventor of a High-Hardness Silicon-Nitride Separating Layer.
Introduction
David W. Worthey is an inventor associated with Monroe, Georgia, United States. His patent work includes an invention concerning a silicon-nitride-containing separating layer designed to combine strong adhesion with high hardness.
Latest Patents
Worthey is credited with 1 patent: “Silicon-nitride-containing separating layer having high hardness.” The patent describes a shaped body with a substrate and a firmly adhering separating layer. The layer contains 92–98 wt.% silicon nitride and 2–8 wt.% silicon dioxide, has a total oxygen content of at least 8 wt.%, and reaches a hardness of at least 10 HB 2.5/3 under DIN EN ISO 6506-1.
Career Highlights
Worthey’s listed patent is associated with 3M Innovative Properties Company. It focuses on material composition and mechanical properties that may be relevant to separating layers used in shaped bodies.
Collaborations
Krishna B. Uibel is identified as Worthey’s coworker. The available information does not specify further details about their collaboration.
Conclusion
David W. Worthey’s patent work highlights a silicon-nitride-based separating layer engineered for firm adhesion, controlled composition, and high hardness.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile