David W Hively

Title: David W Hively: Innovator in Sputter Deposition Technology

Introduction

David W Hively is an accomplished inventor based in Roanoke, VA (US). He has made significant contributions to the field of sputter deposition technology. His innovative approach has led to the development of a unique device that enhances the precision of sputter coating processes.

Latest Patents

David W Hively holds a patent for a "Self-aligned sputter deposition masking device and method." This invention provides a device and method for masking a predetermined area on a surface during sputter deposition. The device includes a plurality of alignment arms that extend above the surface to be sputter coated and terminate above the periphery of the area to be masked. The masking member is designed to have a profile that exactly matches the area to be masked. The alignment arms ensure that the masking member does not contact the surface until it is properly oriented and aligned. This innovative design allows for precise masking of the desired area while preventing any movement away from the masked area.

Career Highlights

David W Hively is currently employed at Itt Corporation, where he continues to work on advancements in sputter deposition technology. His expertise and innovative mindset have made him a valuable asset to the company.

Collaborations

Throughout his career, David has collaborated with notable colleagues, including John C Nelson and Peng-Kuen Chiang. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in his field.

Conclusion

David W Hively is a prominent inventor whose work in sputter deposition technology has made a significant impact. His innovative patent demonstrates his commitment to advancing the field and improving manufacturing processes. His contributions will continue to influence the industry for years to come.