The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 1993

Filed:

Apr. 24, 1992
Applicant:
Inventors:

John C Nelson, Roanoke, VA (US);

Peng-Kuen Chiang, Torrance, CA (US);

David W Hively, Roanoke, VA (US);

Assignee:

ITT Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429811 ; 20429815 ;
Abstract

The present invention is a device and method for masking a predetermined area on a surface during sputter deposition. The present invention includes a plurality of alignment arms that extend above the surface to be sputter coated and terminate above the periphery of the area to be masked. A masking member is formed to have a profile that exactly matches the area to be masked. The alignment arms prevent the masking member from contacting the surface to be sputter coated until the masking member is properly oriented and aligned above the area to be masked. The masking member then passes through the alignment arms, masking the desired area, while the alignment arms prevent the masking member from moving away from the desired masked area.


Find Patent Forward Citations

Nelson, John. (1993). Self-aligned sputter deposition masking device and method (U.S. Patent No. 5268085). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5268085

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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