Company Filing History:
Years Active: 2021-2024
Title: David (Tawei) Lin: Innovator in Ruthenium Polishing Technologies
Introduction
David (Tawei) Lin is a prominent inventor based in Chandler, AZ (US). He has made significant contributions to the field of chemical mechanical polishing, particularly focusing on ruthenium materials. With a total of 4 patents to his name, Lin's work has advanced the technology used in semiconductor manufacturing.
Latest Patents
Among his latest patents, Lin has developed a "Bulk Ruthenium Chemical Mechanical Polishing Composition." This innovative composition is designed to polish surfaces or substrates that include ruthenium. It features a synergistic combination of ammonia and an oxygenated halogen compound, along with abrasives and acids. The composition is formulated to maintain a pH between 6 and 8, ensuring optimal polishing performance.
Another notable patent is the "Barrier Ruthenium Chemical Mechanical Polishing Slurry." This slurry is specifically designed for polishing surfaces that comprise both ruthenium and copper. It includes components such as alkali hydroxide, oxygenated halogen compounds, and halogen alkyl benzotriazole. The formulation allows for a high ruthenium to copper removal rate ratio, making it highly effective in its application.
Career Highlights
David Lin is currently employed at Fujifilm Electronic Materials U.S.A., Inc., where he continues to innovate in the field of electronic materials. His expertise in chemical mechanical polishing has positioned him as a key player in the industry, contributing to advancements that enhance manufacturing processes.
Collaborations
Lin has collaborated with notable colleagues, including Bin Hu and Liqing (Richard) Wen. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.
Conclusion
David (Tawei) Lin's contributions to the field of ruthenium polishing technologies exemplify his commitment to innovation. His patents reflect a deep understanding of chemical processes and their applications in semiconductor manufacturing. Lin's work continues to influence the industry, paving the way for future advancements.