Convent Station, NJ, United States of America

David S Williams


Average Co-Inventor Count = 1.8

ph-index = 3

Forward Citations = 46(Granted Patents)


Location History:

  • Morristown, NJ (US) (1985)
  • Oak Hill, WV (US) (1988)
  • Convent Station, NJ (US) (1990)

Company Filing History:


Years Active: 1985-1990

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3 patents (USPTO):Explore Patents

Title: Innovations of David S. Williams

Introduction

David S. Williams is a notable inventor based in Convent Station, NJ (US). He has made significant contributions to the field of semiconductor technology, holding a total of three patents. His work reflects a deep understanding of materials and processes that enhance the performance of semiconductor devices.

Latest Patents

One of his latest patents is a method for fabricating semiconductor devices that include sources. This innovative method involves forming a material region that contains metal on a semiconductor substrate. The process includes implanting one or more dopants into the material region and subsequently heating the substrate to diffuse the dopants into it. This results in a dopant-diffused substrate region, which is crucial for creating effective sources or drains in semiconductor devices. The method is notable for achieving a specific contact resistance of less than about 10^-6 Ω-cm² and ensuring that the dopant-diffused region has a depth of no more than 0.2 micrometers.

Another patent by Williams is for a dual blade saw attachment. This attachment allows for the concurrent use of two jig saw blades, enhancing the efficiency of cutting tasks. The blades are secured to a holder with threaded fasteners, which can be adjusted to vary the spacing between the blades, providing versatility in cutting applications.

Career Highlights

David S. Williams has worked at AT&T Bell Laboratories, where he contributed to various innovative projects. His experience at such a prestigious institution highlights his expertise and commitment to advancing technology in the semiconductor field.

Collaborations

Throughout his career, Williams has collaborated with notable colleagues, including Ruichen Liu and William T. Lynch. These collaborations have likely enriched his work and contributed to the development of his patents.

Conclusion

David S. Williams is a distinguished inventor whose work in semiconductor technology has led to significant advancements. His innovative patents and career at AT&T Bell Laboratories underscore his impact on the field.

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