Barcelona, Spain

David Ramirez Muela

USPTO Granted Patents = 22 

 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 7(Granted Patents)


Location History:

  • Barcelona, ES (2012 - 2024)
  • Sant Cugat del Valles, ES (2020 - 2024)

Company Filing History:


Years Active: 2012-2024

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22 patents (USPTO):Explore Patents

Title: David Ramirez Muela: A Trailblazer in Innovation

Introduction:

David Ramirez Muela, a visionary inventor based in Barcelona, ES, is a true pioneer in the world of inventions. With a relentless drive to push the boundaries of what is possible, his passion for innovation continues to inspire future generations of inventors and innovators worldwide.

Latest Patents:

David Ramirez Muela holds an impressive 19 patents, with his latest innovations focusing on cutting-edge technologies in the realm of three-dimensional object production. One of his notable patents includes the "Build Layer Coverage Analysis," which revolutionizes the process of generating three-dimensional objects with its innovative methodology.

Career Highlights:

Currently employed at Hewlett-Packard Development Company, L.P., David Ramirez Muela has made significant contributions to the field of additive manufacturing. His inventive spirit and dedication to advancing technologies have led to the development of groundbreaking apparatuses and methods for creating intricate three-dimensional objects with utmost precision and efficiency.

Collaborations:

Throughout his career, David Ramirez Muela has had the opportunity to collaborate with talented individuals in the industry. Among his notable coworkers are Sergio Puigardeu Aramendia and Pol Fornos, who have worked alongside him to bring novel ideas to life and elevate the standards of innovation in their field.

Conclusion:

David Ramirez Muela's remarkable journey as an inventor exemplifies the power of passion, perseverance, and a commitment to driving progress through innovation. His pioneering work not only pushes the boundaries of what is deemed possible but also sets a shining example for aspiring inventors worldwide, leaving a lasting impact on the landscape of technological advancements.

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