The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Jul. 04, 2016
Applicant:

Hewlett-packard Development Company, L.p., Houston, TX (US);

Inventors:

Pol Fornos, Barcelona, ES;

David Ramirez Muela, Barcelona, ES;

Sergio Puigardeu Aramendia, Barcelona, ES;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/393 (2017.01); B33Y 10/00 (2015.01); B33Y 50/02 (2015.01); B29C 64/165 (2017.01); B29C 64/386 (2017.01); B33Y 30/00 (2015.01); B29C 64/209 (2017.01);
U.S. Cl.
CPC ...
B29C 64/393 (2017.08); B29C 64/165 (2017.08); B29C 64/209 (2017.08); B29C 64/386 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B33Y 50/02 (2014.12);
Abstract

Certain examples described herein relate to preparing a base of build material for additive manufacturing. The base is formed from layers of build material that do not form part of an object undergoing additive manufacture. The base is heated by the application of energy, for example using a radiation source. A thermal profile of the base is measured after heating and is used to determine a pattern of application of at least one printing agent to the base. The pattern of application is used to deposit the at least one printing agent upon the base, wherein the presence of the printing agent affects the heating of the base. In this way the pattern of application of printing agent may be used to effect a thermal homogeneity of the base.


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