Wappingers Falls, NY, United States of America

David R DiMilia


Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 2003-2010

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8 patents (USPTO):

Title: The Innovations of David R. DiMilia: A Pioneer in Semiconductor Technologies

Introduction

David R. DiMilia, based in Wappingers Falls, NY, is a prominent inventor with a total of 8 patents to his name. He is extensively recognized for his contributions to the field of semiconductor technologies, specifically in methods involving silicon-germanium (SiGe) layers. DiMilia's work showcases the synergy between innovation and practical application in modern electronics.

Latest Patents

Among David R. DiMilia's latest innovations is his patent on the "Layer transfer of low defect SiGe using an etch-back process." This method describes a sophisticated approach for forming strained silicon or silicon-germanium on relaxed silicon-germanium on insulator (SGOI) or SiGe on silicon heterostructure. The process involves growing epitaxial SiGe layers on a semiconductor substrate, smoothing surfaces using Chemo-Mechanical Polishing (CMP), and bonding two substrates through thermal treatments. The transfer of the SiGe layer from one substrate to another relies on highly selective etching, utilizing SiGe as the etch-stop. Moreover, the transferred SiGe layer can be treated to achieve a smooth upper surface suitable for the epitaxial deposition of various compositions, including strained silicon, strained silicon carbide, and strained germanium, among others.

Career Highlights

David R. DiMilia is associated with the International Business Machines Corporation (IBM), where he has significantly impacted the company's technological advancements through his patented inventions. His extensive expertise in material science and engineering supports IBM's innovation pipeline, particularly in areas related to semiconductor devices.

Collaborations

Throughout his career, DiMilia has collaborated with esteemed colleagues, such as Steven Alan Cordes and James Patrick Doyle. These collaborations have fostered a culture of innovation, allowing them to push the boundaries of technology and enhance the development of cutting-edge semiconductor solutions.

Conclusion

David R. DiMilia stands out as a key figure in the realm of semiconductor innovation. His patents exemplify the fusion of creativity and technical knowledge, paving the way for advancements in electronic devices. As he continues working at IBM, his contributions will undoubtedly shape the future of technology, inspiring future generations of inventors and engineers.

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