David R Beaulieu

Title: The Innovative Mind of David R. Beaulieu

Introduction

David R. Beaulieu, an accomplished inventor based in Wilmington, MA, has made significant contributions to the field of photolithography and sensing technologies. With a total of 2 patents to his name, he has demonstrated expertise and ingenuity in his inventions that push the boundaries of current technology.

Latest Patents

Among his most notable inventions is the "Photolithographic Reduction Imaging of Extended Field," which involves a sophisticated mask or reticle for imaging large microcircuit devices. This patent details a process where an axially centered photolithographic reduction lens, equipped with both a movable mask stage and a movable wafer stage, allows for the imaging of portions of a microcircuit device larger than the image field. This innovative method enhances imaging capabilities through a scanning mode, achieving high resolution within a range of 0.1-0.50 micrometers.

Another groundbreaking invention by Beaulieu is the "Distance and Tilt Sensing Apparatus." This technology projects an image of a light source onto a surface while utilizing a ring reticle positioned in the optical path between the light source and the lens. A secondary lens then conveys a remote image onto a detector, utilizing split light paths for enhanced accuracy. This apparatus effectively measures the tilt of surfaces, providing valuable data around an axis perpendicular to the incident light.

Career Highlights

Beaulieu is currently associated with General Signal Corporation, where he applies his innovative approaches to solving complex engineering challenges. His work significantly contributes to advancements within the corporation and the larger tech industry.

Collaborations

Throughout his career, David R. Beaulieu has collaborated with notable professionals, including John H. Bruning and John D. Wallace. These partnerships underscore the collaborative spirit of innovation, leading to the development of technologies that have the potential to transform various fields.

Conclusion

David R. Beaulieu stands out as an influential inventor whose work in photolithography and sensing apparatuses continues to inspire advancements in technology. His patents reflect a deep understanding of complex engineering principles, as well as a commitment to innovation, ensuring his legacy will endure in the annals of technological progress.