The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 1994
Filed:
Sep. 04, 1992
Applicant:
Inventors:
John H Bruning, Pittsford, NY (US);
David R Beaulieu, Fairport, NY (US);
Assignee:
General Signal Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 77 ; 355 53 ;
Abstract
A mask or reticle for a single large microcircuit device is imaged in portions by an axially centered photolithographic reduction lens having a movable mask stage in addition to a movable wafer stage so that the portions of the complete device are imaged in juxtaposed registry on the wafer. This allows a single microcircuit device larger than the image field of the reduction lens to be imaged in a scanning mode or in a succession of steps forming images at the desired resolution range of 0.1-0.50 .mu.m.