Albany, NY, United States of America

David Power

This inventor holds 1 USPTO granted patent and 10 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Power. Retrieved from https://idiyas.com/inventor/david-power-87ep07pq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: David Power - Innovator in Wafer Alignment Technology

Introduction

David Power is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of wafer alignment. His innovative approach has led to the development of a patented method that enhances the precision of die bonding processes.

Latest Patents

David Power holds a patent for an "Apparatus and method for wafer alignment." This patent describes a method that includes providing a carrier substrate with a die bonded to it, where the die features a first alignment mark on its surface. The method involves positioning a target substrate on a substrate stage, aligning various marks to ensure accurate bonding between surfaces. This innovation is crucial for improving the efficiency and accuracy of semiconductor manufacturing.

Career Highlights

David Power is currently associated with Tokyo Electron Limited, a leading company in the semiconductor industry. His work at this organization has allowed him to apply his inventive skills to real-world applications, contributing to advancements in technology.

Collaborations

Due to space constraints, the details of collaborations will not be included.

Conclusion

David Power's contributions to wafer alignment technology exemplify the impact of innovation in the semiconductor industry. His patented methods continue to influence manufacturing processes, showcasing the importance of precision in technology development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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