This inventor holds 1 USPTO granted patent. Top assignee: University of California. Active years: 2005.
Company Filing History:
Years Active: 2005
Title: The Innovations of David O. Patterson
Introduction
David O. Patterson is an accomplished inventor based in Annandale, VA (US). He has made significant contributions to the field of lithography, particularly with his innovative approach to maskless micro-ion-beam reduction lithography systems. His work has implications for advanced manufacturing processes in the semiconductor industry.
Latest Patents
Patterson holds a patent for a maskless micro-ion-beam reduction lithography system. This system is designed for projecting patterns onto a resist layer on a wafer, achieving feature sizes down to below 100 nm. The MMRL system operates without a stencil mask, which is a notable advancement in lithography technology. Patterns are generated by switching beamlets on and off from a two-electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source, followed by a beam reduction and acceleration column.
Career Highlights
David O. Patterson is affiliated with the University of California, where he has contributed to various research initiatives. His work in lithography has positioned him as a key figure in the development of advanced manufacturing techniques.
Collaborations
Patterson has collaborated with notable colleagues, including Ka-Ngo Leung and William A. Barletta. Their combined expertise has furthered research in the field of lithography and semiconductor manufacturing.
Conclusion
David O. Patterson's innovative contributions to maskless micro-ion-beam reduction lithography systems highlight his role as a leading inventor in the semiconductor industry. His work continues to influence advancements in manufacturing technology.