Langhorne, PA, United States of America

David L Budka

This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David L Budka. Retrieved from https://idiyas.com/inventor/david-l-budka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: David L. Budka: Inventor in Through-Silicon Imaging

Introduction

David L. Budka is an inventor based in Langhorne, Pennsylvania, and is associated with Intel Corporation. His patent work addresses imaging and probing through silicon.

Latest Patents

Budka is named on 1 patent: “Through Silicon Imaging and Probing.” The invention uses a light source to project unpolarized light onto a device under test. A pellicle reflects light toward the device while allowing reflected light to pass through to a camera or other image-capture device. Linear polarizers or half-wave plates can help provide the desired polarization, improving the image captured for inspection.

Career Highlights

Budka’s patent reflects work on optical techniques for examining devices under test. The approach combines controlled light polarization with a pellicle-based optical path to support imaging and probing through silicon.

Collaborations

His listed coworkers include Baohua Niu and Patrick Pardy. The patent information provided identifies Budka’s association with Intel Corporation.

Conclusion

David L. Budka’s patent on through-silicon imaging and probing describes an optical method designed to improve device inspection through carefully managed illumination and polarization.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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