Allen, TX, United States of America

David L Bouldin

This inventor holds 1 USPTO granted patent. Top assignee: Texas Instruments Corporation. Active years: 1990.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 28(Granted Patents)


Company Filing History:


Years Active: 1990

Loading Chart...
1 patent (USPTO):Explore Patents

Title: David L Bouldin: Innovator in Silicide Processes

Introduction

David L Bouldin is a notable inventor based in Allen, Texas. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to silicide processes. His work has implications for improving the efficiency and reliability of electronic devices.

Latest Patents

David L Bouldin holds a patent for an "Isotropic etchant for capped silicide processes." This invention addresses the challenges associated with reactions between siliciding metals and oxygen contaminants, as well as silicon outdiffusion. The patented process involves the formation of a cap layer over the metal layer before performing the silicide reaction. After the reaction, the cap layer is removed using an isotropic etchant that does not degrade the underlying silicide. This innovation enhances the performance and longevity of semiconductor devices.

Career Highlights

Bouldin is currently employed at Texas Instruments Corporation, a leading company in the semiconductor industry. His role at Texas Instruments allows him to apply his expertise in developing advanced technologies that drive innovation in electronic components.

Collaborations

Throughout his career, David has collaborated with talented professionals, including Stephen T Tso and Mark R Calley. These collaborations have contributed to the advancement of semiconductor technologies and the successful implementation of innovative processes.

Conclusion

David L Bouldin's contributions to the field of semiconductor technology through his patent on capped silicide processes exemplify his commitment to innovation. His work continues to influence the development of more efficient electronic devices.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…