Portland, OR, United States of America

David Kennedy

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Intel Corporation. Active years: 2021-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: David Kennedy. Retrieved from https://idiyas.com/inventor/david-kennedy-jo6raa3d

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2021-2023

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: David Kennedy: Innovator in Volumetric Resistance Blowers

Introduction

David Kennedy is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of engineering, particularly in the development of volumetric resistance blowers. With a total of 2 patents to his name, Kennedy continues to push the boundaries of innovation.

Latest Patents

Kennedy's latest patents focus on volumetric resistance blowers. These devices are designed to enhance airflow efficiency and performance. An example of a volumetric resistance blower includes a housing, a motor, and a rotor that is rotated by the motor. Notably, the rotor is constructed of metal foam, which contributes to the blower's effectiveness.

Career Highlights

David Kennedy is currently employed at Intel Corporation, where he applies his expertise in engineering and innovation. His work at Intel has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his coworkers include Ruander Cardenas and Mark Angus MacDonald. Their collective efforts contribute to the advancement of technology and innovation within the company.

Conclusion

David Kennedy is a prominent inventor whose work in volumetric resistance blowers showcases his commitment to innovation. His contributions to the field are significant and continue to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…