Hopewell Junction, NY, United States of America

David K Watts


Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2009-2011

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4 patents (USPTO):Explore Patents

Title: Innovations of David K Watts

Introduction

David K Watts is a notable inventor based in Hopewell Junction, NY (US). He has made significant contributions to the field of electrical engineering, particularly in the semiconductor manufacturing process. With a total of 4 patents, his work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is titled "Electrical contact structures and methods for use - Methods and structures." This invention involves a planarization method that includes providing a contact structure with an axle configured to rotate about an axis of rotation. The structure features a plurality of cantilever arms, each extending radially outward from the axle, and a plurality of electrically conductive spheres. The method allows for the electrochemical reaction to occur on a substrate when an electric voltage is applied, leading to the electrochemical-mechanical planarization of the substrate. Another significant patent focuses on the "Recycling of electrochemical-mechanical planarization (ECMP) slurries/electrolytes." This invention outlines a method for recycling slurries used in semiconductor wafer manufacturing by removing metal ions through ion exchange media and electrochemical deposition.

Career Highlights

David K Watts is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and develop new technologies. His work at IBM has positioned him as a key player in advancing semiconductor manufacturing techniques.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Rui Fang and Deepak Anantarao Kulkarni. These collaborations have further enhanced his contributions to the field.

Conclusion

David K Watts is a distinguished inventor whose work in electrical engineering and semiconductor manufacturing has led to multiple patents and significant advancements in technology. His innovative methods and structures continue to influence the industry positively.

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