David Jacques

Title: David Jacques - Innovator in X-ray Diffraction Technology

Introduction

David Jacques is a notable inventor based in Durham, GB. He has made significant contributions to the field of X-ray diffraction, particularly through his innovative methods for analyzing multi-layered materials. His work is essential for advancing technologies that rely on precise measurements of material properties.

Latest Patents

David Jacques holds a patent for a method titled "Fast measurement of X-ray diffraction from tilted layers." This invention involves directing a converging beam of X-rays toward a surface of a sample that consists of multiple single-crystal layers. The method includes at least a first layer and a second layer that is formed over and tilted relative to the first layer. The X-rays that are diffracted from each of these layers are sensed simultaneously, allowing for the generation of a diffraction spectrum. This spectrum includes at least a first diffraction peak due to the first layer and a second diffraction peak due to the second layer. The analysis of this diffraction spectrum enables the identification of characteristics of at least the second layer.

Career Highlights

David Jacques is currently associated with Jordan Valley Semiconductors Ltd., where he applies his expertise in X-ray diffraction technology. His innovative approach has positioned him as a key figure in the development of advanced measurement techniques in the semiconductor industry.

Collaborations

Throughout his career, David has collaborated with notable professionals in his field, including John Leonard Wall and Boris Yokhin. These collaborations have further enhanced the impact of his work and contributed to advancements in X-ray diffraction technology.

Conclusion

David Jacques is a pioneering inventor whose work in X-ray diffraction has significant implications for material analysis. His contributions continue to influence the semiconductor industry and beyond.