Vancouver, WA, United States of America

David J Vickrey

This inventor holds 1 USPTO granted patent. Top assignee: Seh America, Inc.. Active years: 1999.


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: David J Vickrey: Innovator in Crystal Growth Technology

Introduction

David J Vickrey is an accomplished inventor based in Vancouver, WA (US). He has made significant contributions to the field of crystal growth technology. His innovative approach has led to the development of a unique method for measuring the diameter and melt of crystals during their growth process.

Latest Patents

David holds a patent for a method that utilizes a CCD camera to measure the diameter of a growing crystal. This method employs optical recognition of the luminous ring at the crystal-melt interface. The invention aims to eliminate the negative effects of orbit, melt-level, and incorrect camera angle. The CCD camera is strategically positioned to focus on half of the crystal's circumference as it grows. An automatic control system measures the diameter using two diametrically opposed points on the crystal and computes the melt level error with a third point closest to the camera. This system optimizes crystal diameter by controlling the crucible height and crystal pull rate.

Career Highlights

David J Vickrey is currently employed at Seh America, Inc., where he continues to innovate in the field of crystal growth. His work has garnered attention for its practical applications in various industries.

Collaborations

David collaborates with his coworker, Barton V White, to further enhance the technology and applications of their inventions.

Conclusion

David J Vickrey's contributions to crystal growth technology exemplify the impact of innovative thinking in scientific advancements. His patented methods are paving the way for more efficient and precise crystal growth processes.

Profile summary based on public USPTO records.
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