David H Peterson

Title: David H. Peterson: Innovator in Lithography Tool Technology

Introduction

David H. Peterson is a notable inventor based in Shelton, CT (US). He has made significant contributions to the field of lithography through his innovative patent. His work focuses on enhancing the efficiency and effectiveness of reticle cleaning processes in lithography tools.

Latest Patents

David H. Peterson holds a patent for an "Apparatus and method of cleaning reticles for use in a lithography tool." This invention involves a reticle cleaning apparatus that utilizes an ultraviolet light source in an oxygen-containing environment to cleanse organic contaminants from a reticle. The apparatus allows for the storage of multiple reticles in an environment that contains organic contaminants. A stored reticle can be translated to a cleaning station within the lithography tool, enabling the cleaning process to occur while the tool is in operation. This innovative approach ensures that the reticle cleaning process is performed at room temperature and atmospheric pressure, optimizing the overall functionality of the lithography tool.

Career Highlights

David H. Peterson is associated with Silicon Valley Group, Inc., where he has contributed his expertise in lithography technology. His work has been instrumental in advancing the capabilities of lithography tools, making them more efficient and effective in the manufacturing process.

Collaborations

One of his notable coworkers is Cindy J. Hayden, with whom he has likely collaborated on various projects within the company.

Conclusion

David H. Peterson's innovative contributions to lithography tool technology, particularly through his patent for reticle cleaning, highlight his role as a significant inventor in the field. His work continues to influence the efficiency of lithography processes in the industry.