Victor, NY, United States of America

David H Outterson

This inventor holds 1 USPTO granted patent. Top assignee: Eastman-Kodak Company. Active years: 1992.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 54(Granted Patents)


Company Filing History:


Years Active: 1992

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of David H. Outterson

Introduction

David H. Outterson is a notable inventor based in Victor, NY (US). He has made significant contributions to the field of digital profilometry, particularly through his innovative patent. His work has implications for various applications, enhancing the precision and efficiency of measurements in complex environments.

Latest Patents

Outterson holds a patent for a "Method and apparatus for digital moire profilometry calibrated for projectors and cameras." This invention involves a system where projectors and cameras are strategically positioned around an object under test to gather digital moire information. The calibration process utilizes a pattern of straight lines on a flat reference surface, ensuring accurate measurements of the object’s dimensions. The system is designed to convert video signals from the camera into digital moire information, which is then transformed into absolute distance measurements along the object's cross-sections.

Career Highlights

David H. Outterson is associated with Eastman Kodak Company, where he has applied his expertise in developing advanced imaging technologies. His work has contributed to the company's reputation for innovation in the field of photography and imaging systems.

Collaborations

Outterson has collaborated with notable colleagues, including Kenneth H. Womack and Brian J. Kwarta. These partnerships have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

David H. Outterson's contributions to digital profilometry exemplify the impact of innovative thinking in technology. His patent reflects a commitment to enhancing measurement accuracy, which is crucial in various scientific and industrial applications.

Profile summary based on public USPTO records.
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