Santa Clara, CA, United States of America

David H Kim

This inventor holds 1 USPTO granted patent. Top assignee: Synopsys, Inc.. Active years: 2013.


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovations of David H Kim

Introduction

David H Kim is a notable inventor based in Santa Clara, CA. He has made significant contributions to the field of integrated circuit design. His work focuses on enhancing the accuracy of photolithographic processes used in semiconductor manufacturing.

Latest Patents

David H Kim holds a patent for a technique titled "Lithographically Enhanced Edge Determination." This invention modifies a target pattern associated with an integrated-circuit design to ensure that the polygons representing features in the design achieve acceptable accuracy during the photolithographic process. The method involves adjusting polygon parameters to meet a cost function that aligns the modified target pattern with an estimated target pattern produced during fabrication. This innovation is crucial for improving the efficiency and precision of semiconductor die production.

Career Highlights

David H Kim is currently employed at Synopsys, Inc., a leading company in electronic design automation. His expertise in integrated circuit design has positioned him as a valuable asset within the organization. He has demonstrated a commitment to advancing technology through his innovative approaches.

Collaborations

David has collaborated with esteemed colleagues such as Changqing Hu and Thomas Christopher Cecil. Their combined efforts contribute to the ongoing advancements in semiconductor technology.

Conclusion

David H Kim's contributions to the field of integrated circuit design and his innovative patent demonstrate his commitment to enhancing semiconductor manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
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