Framingham, MA, United States of America

David H Altman

USPTO Granted Patents = 17 

 

Average Co-Inventor Count = 2.9

ph-index = 6

Forward Citations = 88(Granted Patents)


Location History:

  • Sudbury, MA (US) (2019 - 2022)
  • Marlborough, MA (US) (2022)
  • Framingham, MA (US) (2009 - 2023)

Company Filing History:


Years Active: 2009-2023

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17 patents (USPTO):Explore Patents

Title: David H Altman - Innovator in Thermal Capacitor Technology

Introduction

David H Altman is a prominent inventor based in Framingham, MA, known for his contributions to the field of thermal capacitor technology. With a remarkable portfolio of 17 patents, Altman has made significant strides in creating innovative solutions that enhance the efficiency of electronic assemblies.

Latest Patents

Among his latest inventions are two noteworthy patents. The first is the "Shape memory thermal capacitor and methods for same," which details an electronic assembly featuring a thermal capacitor. This invention includes an electronic substrate comprised of insulating and conductive layers, integrating a shape memory thermal capacitor that utilizes a shape memory core made of specialized material.

The second patent is titled "Selectively-pliable chemical vapor deposition (CVD) diamond or other heat spreader." This system introduces a component designed to generate thermal energy, complemented by a heat spreader that effectively removes this energy. The heat spreader consists of two portions, with the first portion containing high aspect-ratio structures that allow for pliability, accommodating thermal expansion mismatches between materials in the heat spreader and the substrate.

Career Highlights

David H Altman has gained invaluable experience working with top-tier organizations such as Raytheon Company and the United States Army, where he contributed his expertise to innovative projects and technological advancements. His work has played a crucial role in enhancing the functionality and performance of electronic systems.

Collaborations

Throughout his career, Altman has collaborated with notable colleagues, including Anurag Gupta and Erik F Nordhausen. These partnerships have furthered his research and development efforts, leading to groundbreaking inventions that push the boundaries of current technology.

Conclusion

David H Altman stands out as an influential inventor with a focus on thermal capacitor technology. His extensive patent portfolio reflects his dedication to innovation and emphasizes the importance of collaboration in achieving technological advancements. As he continues to develop new methods and devices, Altman's work will likely inspire future investigators and improve the efficiency of electronic systems worldwide.

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