David G Lishan

Title: The Innovative Mind of David G. Lishan

Introduction

David G. Lishan, an accomplished inventor based in Clearwater, Florida, has made significant contributions to the field of materials processing. With an impressive portfolio that includes two patents, Lishan has demonstrated a remarkable ability to innovate and advance technology related to substrate processing and thin film fabrication.

Latest Patents

Lishan's latest patents highlight his expertise in advanced fabrication methods. One of his notable inventions is the "Method for removing re-sputtered material from patterned sidewalls." This innovation provides a novel approach to eliminating undesired re-sputtered material from a substrate, using a combination of a process chamber with a plasma source and a carefully designed masking material. The removal of the sacrificial layer after processing showcases the precision of Lishan’s methodology.

Another significant patent is the "Method for thin film lift-off processes using lateral extended etching masks and device." This method involves the formation of an etching mask structure on a substrate, allowing for the lateral expansion of this mask during metal deposition. The self-aligned metal layer can then be meticulously lifted, enabling the creation of complex electronic devices, including bipolar and field-effect transistors.

Career Highlights

Throughout his career, David G. Lishan has been affiliated with notable organizations, including Unaxis USA Inc. and Cornell University. His work in these institutions has been instrumental in furthering research and development within the semiconductor industry, particularly in regards to innovative fabrication techniques.

Collaborations

Lishan has collaborated with various talented individuals, enhancing his research endeavors. Notable coworkers such as Kyle Dorsey and Vincent J. Genova have contributed to his projects, fostering a collaborative environment that promotes innovation and knowledge exchange in their field.

Conclusion

David G. Lishan exemplifies the spirit of innovation, utilizing his intellectual prowess to develop groundbreaking technologies that facilitate advancements in materials science and electronics. His patents serve as a testament to his creativity and dedication to improving industrial processes, solidifying his status as a valuable contributor to the field of invention.