Location History:
- Villemandeur, FR (2001)
- Grenoble, FR (2004)
Company Filing History:
1 out of 1,156 
1 out of 833,002 Years Active: 2001-2004
Title: The Innovative Mind of David Fuard
Introduction
David Fuard is a prominent inventor based in Grenoble, France. He holds two patents that highlight his contributions to the field of microelectronics. His work, particularly in transistor structures and polymer materials, showcases the innovative spirit that drives technological advancement.
Latest Patents
Among his latest patents is a process for making a gate for a short channel CMOS transistor structure. This invention represents a significant step forward in transistor technology, addressing critical challenges in the design and efficiency of these components. Another noteworthy patent is focused on the anisotropic etching of an organic dielectric polymer material using a plasma gas. This process utilizes a gas mixture that may include oxygen and nitrogen, among others, with a specific concentration to optimize the etching process. This technology is especially relevant for fabricating metal interconnects in damascene-type structures of integrated circuits, making substantial contributions to the microelectronics industry.
Career Highlights
Throughout his career, David Fuard has been associated with notable companies such as France Telecom, where he applied his innovative thoughts to enhance communication technology. His patents reflect a deep understanding of materials science and engineering, making him a valuable asset to the sectors he has worked in.
Collaborations
David has collaborated with esteemed professionals, including Olivier Joubert and Gilles Cunge. These collaborations have fostered an environment of creativity and knowledge sharing, furthering the development of cutting-edge technologies in microelectronics.
Conclusion
David Fuard's contributions to the field of inventions in microelectronics are commendable. With a robust portfolio of patents and collaborative efforts, he continues to influence the trajectory of technological advancements. His innovative approaches to complex challenges have solidified his reputation as a leading inventor in his field.