David C Paurus

Title: David C Paurus: Innovator in Self-Cleaning Colloidal Slurry Technology

Introduction

David C Paurus is a notable inventor based in Byron, MN (US). He has made significant contributions to the field of materials science, particularly in the development of self-cleaning colloidal slurry compositions. With a total of 6 patents to his name, Paurus has demonstrated a commitment to innovation and problem-solving in technology.

Latest Patents

One of Paurus's latest patents is for a self-cleaning colloidal slurry composition and process for finishing the surface of a substrate. This invention is particularly useful for data storage devices, where maintaining a clean surface is crucial. The slurry consists of a carrying fluid, colloidal particles, etchant, and a surfactant that prevents contaminants from bonding to the substrate surface. The application of this slurry, combined with mechanical rubbing, allows for a superfinish of glass disk substrates to a surface roughness of less than 2 nanometers, ensuring minimal surface contamination after cleaning.

Career Highlights

Throughout his career, David C Paurus has worked with prominent companies such as IBM and Hitachi Global Storage Technologies Netherlands B.V. His experience in these organizations has contributed to his expertise in developing innovative solutions for complex technological challenges.

Collaborations

Paurus has collaborated with notable colleagues, including Steven L Maynard and Frederick Paul Benning. These partnerships have likely enriched his work and contributed to the advancements in his field.

Conclusion

David C Paurus stands out as an influential inventor in the realm of self-cleaning technologies. His innovative patents and career achievements reflect his dedication to advancing materials science and technology.