The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Oct. 12, 2001
Frederick Paul Benning, Rochester, MN (US);
James A. Hagan, Rochester, MN (US);
Steven L. Maynard, Rochester, MN (US);
David C. Paurus, Byron, MN (US);
Douglas Howard Piltingsrud, Eyota, MN (US);
Jon Edward Podolske, Plainview, MN (US);
Frederick Paul Benning, Rochester, MN (US);
James A. Hagan, Rochester, MN (US);
Steven L. Maynard, Rochester, MN (US);
David C. Paurus, Byron, MN (US);
Douglas Howard Piltingsrud, Eyota, MN (US);
Jon Edward Podolske, Plainview, MN (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A self-cleaning colloidal slurry and process for finishing a surface of a glass, ceramic, glass-ceramic, metal or alloy substrate for use in a data storage device, for example. The slurry comprises a carrying fluid, colloidal particles, etchant, and a surfactant adsorbed and/or precipitated onto a surface of the colloidal particles and/or substrate. The surfactant has a hydrophobic section that forms a steric hindrance barrier and substantially prevents contaminates, including colloidal particles, from bonding to the substrate surface. The slurry is applied to the surface of the substrate while a pad mechanically rubs the surface. Subsequent cleaning with standard soap solutions removes substantially all remaining contamination from the substrate surface. In an exemplary embodiment, the slurry is used to superfinish a glass disk substrate to a surface roughness of less than 2 Å, with substantially no surface contamination as seen by atomic force microscopy (AFM) after standard soap cleaning steps.