Company Filing History:
Years Active: 2001-2008
Title: The Innovations of Frederick Paul Benning
Introduction
Frederick Paul Benning is a notable inventor based in Rochester, MN (US). He has made significant contributions to the field of data storage technology, holding a total of 6 patents. His work focuses on innovative solutions that enhance the performance and cleanliness of substrates used in various applications.
Latest Patents
One of Benning's latest patents is a self-cleaning colloidal slurry composition and process for finishing a surface of a substrate. This invention is particularly useful for glass, ceramic, glass-ceramic, metal, or alloy substrates used in data storage devices. The slurry consists of a carrying fluid, colloidal particles, etchant, and a surfactant that forms a steric hindrance barrier. This barrier effectively prevents contaminants from bonding to the substrate surface. The application of the slurry, combined with mechanical rubbing, allows for a thorough cleaning process. After treatment, the substrate can achieve a surface roughness of less than 2 nanometers, with minimal contamination as verified by atomic force microscopy (AFM) following standard soap cleaning steps.
Career Highlights
Throughout his career, Frederick Paul Benning has worked with prominent companies in the technology sector. He has been associated with IBM and Hitachi Global Storage Technologies, where he contributed to advancements in data storage solutions. His expertise in developing innovative materials and processes has made a significant impact in the industry.
Collaborations
Benning has collaborated with several professionals in his field, including Steven L. Maynard and Jon Edward Podolske. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Frederick Paul Benning's contributions to the field of data storage technology through his innovative patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in substrate cleaning and finishing processes, showcasing the importance of innovation in technology.