David Bailey

Title: David Bailey: Innovator in Chemical Mechanical Polishing

Introduction

David Bailey is an accomplished inventor based in Victor, NY (US). He holds a patent that showcases his expertise in the field of chemical mechanical polishing. His innovative work contributes significantly to advancements in materials science and engineering.

Latest Patents

David Bailey's notable patent is titled "Derivatized Polyamino Acids." This composition includes a polymer that consists of a derivatized amino acid monomer unit. The patent describes a chemical mechanical polishing composition that features a water-based liquid carrier, abrasive particles dispersed within the carrier, and a cationic polymer containing the derivatized amino acid monomer unit. The method outlined in the patent utilizes this composition to effectively remove portions of metal or dielectric layers from substrates, thereby achieving a polished finish.

Career Highlights

David Bailey is currently employed at CMC Materials, Inc., where he applies his knowledge and skills in the development of advanced materials. His work at the company has positioned him as a key contributor to innovative solutions in the industry.

Collaborations

Throughout his career, David has collaborated with talented individuals such as Na Zhang and Kevin P. Dockery. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

David Bailey's contributions to the field of chemical mechanical polishing through his patent and work at CMC Materials, Inc. highlight his role as an influential inventor. His innovative approaches continue to shape advancements in materials science.