David B Fenner

Title: Innovations of David B Fenner

Introduction

David B Fenner is a notable inventor based in Westford, MA (US). He has made significant contributions to the field of surface processing technology, holding a total of four patents. His work primarily focuses on improving the quality and uniformity of surfaces in various materials.

Latest Patents

Fenner's latest patents include "Adaptive GCIB for smoothing surfaces" and "System and method for improving thin films by gas cluster ion beam processing." The first patent discloses a method of processing the surface of a workpiece using an adaptive gas cluster ion beam. This invention aims to reduce surface roughness and improve surface smoothing by etching at various rates. The process begins with an initial etch rate, which is then adjusted to lower rates, resulting in minimal processing time and reduced material removal. The second patent provides apparatus and methods to reduce surface roughness and improve thickness uniformity, particularly for silicon-on-insulator (SOI) wafers. This invention also focuses on cleaning the surface of the silicon film, making it free from contaminants.

Career Highlights

David B Fenner is currently associated with Epion Corporation, where he continues to innovate in the field of surface processing. His expertise and inventions have significantly impacted the industry, particularly in enhancing the performance of thin-film electronic and photonic materials.

Collaborations

Fenner collaborates with various professionals in his field, including his coworker Lisa P Allen. Their combined efforts contribute to the advancement of technologies related to surface processing.

Conclusion

David B Fenner's contributions to surface processing technology through his innovative patents demonstrate his commitment to improving material quality. His work at Epion Corporation continues to influence the industry positively.